Silver etchant TFS semiconductor grade

Supplier: Transene

Silver Etchant TFS is a fast etchant for silver films. Excellent photoresist compatibility.

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Copper etchant 49-1 semiconductor grade

Supplier: Transene

Copper Etchant 49-1 is a highly selective, moderate etch rate copper etchant. Will not attack photoresist or other metals, including nickel.

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Indium tin oxyde (ITO) etchant TE-100 semiconductor grade

Supplier: Transene

ITO Etchant TE-100 is an effective etchant for indium tin oxide films. Will not harm glass substrates.

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2-Propanol ≥99.80%, Low-Metal (LM) grade

Supplier: Transene

Transene Isopropyl Alcohol LM (synonyms include IPA, 2-propanol, and isopropanol) is a "low metals" alcohol suitable for demanding semiconductor and electronics processing. Effective for cleaning, degreasing, and other applications. Low water content.

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Acetone ≥99.90%, Low-Metal (LM) grade semiconductor grade

Supplier: Transene

Transene Acetone LM grade is a "low metals" solvent suitable for electronics and semiconductor cleaning and processing. Low water content.

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Copper etchant APS-100 semiconductor grade

Supplier: Transene

Copper Etchant APS-100 is an ammonium persulfate solution with excellent control for fine-line etching of copper films in integrated circuits.

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Gold entchant GE-8148 semiconductor grade

Supplier: Transene

Gold Etchant GE-8148 is a faster gold etchant designed to minimize attack on nickel. Excellent photoresist compatibility.

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Xylene (mixture of isomers) ≥99.50%, Low-Metal (LM) grade semiconductor grade

Supplier: Transene

Transene Xylenes solvent is a "low metals" chemical suitable for demanding semiconeuctor and elecrtronics processing.

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Tetramethylammonium hydroxide 2,14% semiconductor grade NOVO DEVELOPER 842

Supplier: Transene

Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.

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Buffered oxide etch 6:1 (BOE 6:1) semiconductor grade, with surfactant

Supplier: Transene

Buffered Oxide Etchant 6:1 with surfactant is a moderate-speed etchant for oxide films. 6:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.

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Reagent semiconductor etchant RSE-100 semiconductor grade

Supplier: Transene

RSE-100 is a nitric/HF/acetic formulation for controlled anisotropic etching of amorphouse or crystalline silicon.

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Chromium etchant 1020AC semiconductor grade

Supplier: Transene

Chromium Etchant 1020AC is a slower etchant for chrome thin films or photomasks. Slower etch rate provides better control, enhanced fine-line definition, and compatibility with a broader range of materials and photoresists.