"Transene"

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Buffered oxide etch 10:1 (BOE 10:1) semiconductor grade

Supplier: Transene

Buffered Oxide Etchant 10:1 is a reduced-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF.

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Buffered oxide etch 6:1 (BOE 6:1) semiconductor grade

Supplier: Transene

Buffered Oxide Etchant 6:1 is a moderate-speed etchant for oxide films. 6:1 ratio of ammonium fluoride: HF.

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Nitric acid 69.5-70%, Low-Metal (LM) grade semiconductor grade

Supplier: Transene

Transene Nitric Acid LM is a "low metals" nitric acid solution suitable for demanding semiconductor and electronics processing.

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N-Methyl-2-pyrrolidone (NMP), Low-Metal (LM) grade semiconductor grade

Supplier: Transene

NMP is suitable for a broad range of photoresist stripping applications.

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Sulfuric acid ≥96%, Low-Metal (LM) grade semiconductor grade

Supplier: Transene

Transene Sulfuric Acid LM is a "low metals" solution suitable for demanding semiconductor and electronics processing.

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Nickel etchant TFG semiconductor grade

Supplier: Transene

Nickel Etchant TFG is a specially formulated etchant for electroless or electrolytic nickel films. May also be used for nickel vanadium (NiV) films or any nickel film containing non-nickel impurities. Will not attack gallium arsenide (GaAs).

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Hydrogen peroxide 30%, Low-Metal (LM) grade semiconductor grade

Supplier: Transene

Transene Hydrogen Peroxide LM is a "low metals" peroxide solution suitable for demanding semiconductor and electronics processing. Stabilizer is not needed at these low metal impurity levels.

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Titanium etchant TFT semiconductor grade

Supplier: Transene

Titanium Etchant TFT is a general purpose titanium etchant with a controlled etch rate.

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Acetic acid ≥99.70%, Low-Metal (LM) grade semiconductor grade

Supplier: Transene

Transene Acetic Acid LM grade is a high-purity acetic acid suitable for semiconductor and elecrtonics applications. Low metal ion content is assured. Quart bottle.

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Ammonia solution 29%, Low-Metal (LM) grade semiconductor grade

Supplier: Transene

Transene Ammonium Hydroxide 29% LM is a "low metals" grade suitable for semiconductor and electronics processing.

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Gold entchant TFA semiconductor grade

Supplier: Transene

Gold Etchant TFA is a general purpose etchant for etching fine lines in gold thin films. Excellent photoresist compatibility. Suitable for gold bump processing. Gold Etchant TFA also etches nickel.

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Buffered oxide etch 10:1 (BOE 10:1) semiconductor grade, with surfactant

Supplier: Transene

Buffered Oxide Etchant 10:1 with surfactant is a slower-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.

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Palladium etchant TFP semiconductor grade

Supplier: Transene

Palladium Etchant TFP is a non-cyanide formulation for controlled etching of palladium films.

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Chromium etchant 1020 semiconductor grade

Supplier: Transene

Chromium Etchant 1020 is an excellent general purpose etchant for chrome thin films or photomasks.

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Titanium etchant TFTN semiconductor grade

Supplier: Transene

Titanium Etchant TFTN is HF-free with a slow etch rate for fine line etching of titanium films. Will not attack glass/oxide.

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Hydrofluoric acid 49%, Low-Metal (LM) grade semiconductor grade

Supplier: Transene

Transene Hydrofluoric Acid LM is a "low metals" HF solution suitable for demanding semiconductor and electronics processing. Fast removal of oxides and nitrides.