647 Results for: "Hydrogen Peroxide"
Hydrogen peroxide, Supelco®
Supplier: MilliporeSigma
OmniTrace Ultra™ Hydrogen Peroxide
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Hydrogen peroxide 3% (w/w) in aqueous solution stabilized, VWR Chemicals BDH®
Supplier: VWR International
Hydrogen peroxide 3% (w/w) in aqueous solution stabilised analytical reagent, VWR Chemicals BDH®
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Hydrogen peroxide solution 30% stabilised, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIAL LLC
Hydrogen peroxide solution 30% stabilised, J.T.Baker®
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Hydrogen peroxide 30%, Finyte® for microelectronic, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIAL LLC
Hydrogen peroxide 30%, Finyte® for microelectronic, J.T.Baker®
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Hydrogen peroxide solution 35%, BAKER ANALYZED®, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIAL LLC
Hydrogen Peroxide Solution, 35%, BAKER ANALYZED® Reagent
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Hydrogen peroxide 35%, Technical Grade
Supplier: Columbus Chemical Industries, Inc
Hydrogen peroxide 35%, Technical Grade
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Hydrogen peroxide 30% stabilized, CMOS for microelectronic use, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIAL LLC
Hydrogen peroxide 30% stabilised, CMOS for the electronics industry, J.T.Baker®
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Hydrogen peroxide 30% stabilized, Electronic Grade, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIAL LLC
Hydrogen peroxide 30% stabilised, Electronic Grade
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Hydrogen peroxide 30% (w/w) in water unstabilized ACS
Supplier: Thermo Scientific Chemicals
Hydrogen peroxide 30% (w/w) in water unstabilised ACS
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Hydrogen peroxide solution 30%, AR Select® ACS for trace metal analysis, Macron Fine Chemicals™
Supplier: AVANTOR PERFORMANCE MATERIAL LLC
Hydrogen Peroxide, 30% Solution, AR Select® (ACS)
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Hydrogen peroxide 3% (w/w) in aqueous solution stabilized, VWR Chemicals BDH®
Supplier: VWR International
Made with deionized water.
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Hydrogen peroxide 30.00 - 32.00% LP
Supplier: KMG
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
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Hydrogen peroxide 30%, Gigabit® for the electronics industry
Supplier: KMG
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
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Hydrogen peroxide (30 - 40%) 30% stabilised ACS analytical reagent, VWR Chemicals BDH®
Supplier: VWR International
Hydrogen peroxide (30 - 40%) 30% stabilised ACS analytical reagent, VWR Chemicals BDH®
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Hydrogen peroxide 12% (w/v)
Supplier: Thermo Scientific Chemicals
Hydrogen peroxide 12% (w/v)
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Hydrogen peroxide 30% stabilized, CMOS for the electronics industry, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIAL LLC
Hydrogen peroxide 30% stabilised, CMOS for the electronics industry, J.T.Baker®
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Hydrogen peroxide 35% (w/w) in water stabilized, Technical Grade
Supplier: Thermo Scientific Chemicals
Hydrogen peroxide 35% (w/w) in water stabilised, Technical Grade
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Hydrogen peroxide solution 50 mM stabilized, ReadiUse™
Supplier: AAT BIOQUEST INC
Compared to other commercial hydrogen peroxide solutions, our formulated hydrogen peroxide solution is much more stable.
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Hydrogen peroxide 6% in aqueous solution stabilized, VWR Chemicals BDH®
Supplier: VWR International
Made with purified water.
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Hydrogen peroxide solution 31% (w/w)
Supplier: Aqua Solutions
Hydrogen peroxide solution 31% (w/w)
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Hydrogen peroxide solution 15%
Supplier: Hardy Diagnostics
A high strength 15% solution of hydrogen peroxide especially recommended for the detection of catalase activity in anaerobic bacteria.
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Hydrogen peroxide 35% (w/w) in water stabilized
Supplier: BeanTown Chemical
CAS: 7722-84-1; EC No: 231-765-0; MDL No: MFCD00011333; RTECS: MX0899000 UN No: UN2014; Haz Class: 5.1 (8); Packing Group: II Liquid; Molecular Formula: H2O2; MW: 34.02
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Hydrogen peroxide 3% (w/w) in water stabilized, Fluka™
Supplier: Honeywell Research Chemicals
contains ∼200 ppm acetanilide as stabilizer
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Hydrogen peroxide 30 - 32%, ARISTAR® ULTRA, Ultrapure for trace metal analysis, VWR Chemicals BDH®
Supplier: BDH
Ultra high purity acid for quantitative trace metal analysis at the parts-per-trillion (ppt) level.
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Hydrogen peroxide 30%, Cleanroom® MB for the electronics industry
Supplier: KMG
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
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Hydrogen peroxide 30% stabilized ACS, VWR Chemicals BDH®
Supplier: VWR International
Stabilized with Sodium Stannate.
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Hydrogen peroxide 35% (w/w) in water stabilized for analysis
Supplier: Thermo Scientific Chemicals
Hydrogen peroxide 35% (w/w) in water stabilized for analysis
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Hydrogen peroxide 3% (w/w) in water stabilized
Supplier: Thermo Scientific Chemicals
Hydrogen peroxide 3% (w/w) in water stabilized
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Hydrogen peroxide solution 3% (by KMnO₄ titration), AR®, Macron Fine Chemicals™
Supplier: AVANTOR PERFORMANCE MATERIAL LLC
Clear, colorless liquid.
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Hydrogen peroxide 30%, ULTREX® II, Ultrapure for trace metal analysis, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIAL LLC
Hydrogen peroxide 30%, ULTREX® II, Ultrapure for trace metal analysis, J.T.Baker®
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Supplier: VWR International
Supplier: VWR International
Supplier: VWR International
Supplier: VWR International
Supplier: VWR International
Supplier: VWR International
Supplier: BDH
Supplier: VWR International
Supplier: Janitorial Supplies
Supplier: Kimberly-Clark
Supplier: New Pig
Supplier: VWR International
Supplier: VWR International
Supplier: VWR International
Supplier: VWR International
Supplier: VWR International
Supplier: VWR International
Supplier: VWR International