Buffered oxide etch (7:1), CMOS, J.T.Baker®
: Avantor
:
:8,II
:Management of Change (MOC) category = R
:2922
:GHS05
:GHS06
:GHS08
- Ammonium Fluoride (NH₄F)(w/w):34.3 - 35.3 %
- Hydrofluoric Acid (HF)(w/w):6.18 - 6.48 %
- Residue after Ignition:≤10 ppm
- Chloride (Cl):≤3000.0 ppb
- Nitrate (NO₃):≤3000 ppb
- Phosphate (PO₄):≤700.0 ppb
- Sulfate (SO₄):≤1500.0 ppb
- Trace Impurities - Aluminum (Al):≤50.0 ppb
- Arsenic and Antimony (as As):≤30.0 ppb
- Trace Impurities - Barium (Ba):≤10.0 ppb
- Trace Impurities - Beryllium (Be):≤10.0 ppb
- Trace Impurities - Bismuth (Bi):≤20.0 ppb
- Trace Impurities - Boron (B):≤50 ppb
- Trace Impurities - Cadmium (Cd):≤20.0 ppb
- Trace Impurities - Calcium (Ca):≤100.0 ppb
- Trace Impurities - Chromium (Cr):≤10.0 ppb
- Trace Impurities - Cobalt (Co):≤10.0 ppb
- Trace Impurities - Copper (Cu):≤10.0 ppb
- Trace Impurities - Gallium (Ga):≤10.0 ppb
- Trace Impurities - Germanium (Ge):≤40.0 ppb
- Trace Impurities - Gold (Au):≤20 ppb
- Heavy Metals (as Pb):≤1000.0 ppb
- Trace Impurities - Iron (Fe):≤50.0 ppb
- Trace Impurities - Lead (Pb):≤10.0 ppb
- Trace Impurities - Lithium (Li):≤10.0 ppb
- Trace Impurities - Magnesium (Mg):≤50.0 ppb
- Trace Impurities - Manganese (Mn):≤10.0 ppb
- Trace Impurities - Molybdenum (Mo):≤10.0 ppb
- Trace Impurities - Nickel (Ni):≤10.0 ppb
- Trace Impurities - Potassium (K):≤50 ppb
- Trace Impurities - Silver (Ag):≤50 ppb
- Trace Impurities - Sodium (Na):≤100.0 ppb
- Trace Impurities - Strontium (Sr):≤10.0 ppb
- Trace Impurities - Thallium (Tl):≤20.0 ppb
- Trace Impurities - Tin (Sn):≤20.0 ppb
- Trace Impurities - Titanium (Ti):≤100.0 ppb
- Trace Impurities - Zinc (Zn):≤100.0 ppb
- Particle Count - 0.5 µm and greater:≤150 par/ml
- Particle Count - 1.0 µm and greater:≤8 par/ml
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