Silicon Nitride TEM Window Grids, Electron Microscopy Sciences

Supplier: ELECTRON MICROSCOPY SCIENCE

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Supplier: ELECTRON MICROSCOPY SCIENCE

About this item

Silicon Nitride TEM Window Grids perform well under harsh lab conditions.

Plasma cleanable - can be vigorously plasma cleaned to remove organic contamination
Field to field uniformity - less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid
Tolerates temperatures above 1000 °C - supports use in environmental TEMs where dynamic processes are observed at high temperatures
Withstands harsh conditions - provides an ideal balance of imaging resolution, chemical stability and mechanical strength
Incorporates LPCVD, low-stress(~250 MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces

The silicon frames are 100 µm thick. Grids fit standard 3 mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation.

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