About this item
Vacuum pump units with a two- or three-stage chemistry diaphragm pump. Compact construction with chemistry diaphragm pump on base plate, separator on suction side made of glass with protective coating (AK), one or two electromagnetic chemistry valves on the suction line, exhaust waste vapour condenser with collecting flask, and one or two CVC 3000 vacuum controllers on the controller support.
- Oil-free vacuum down to 7 mbar
- Equipped with chemistry diaphragm pumps with high chemical resistance (parts in contact with media are made from PTFE compounds and similar)
- Vacuum controller for optimum vacuum control and regulation
- Solenoid valve on the suction line (24 V-)
- Long-lasting valves and diaphragms
- Insulated exhaust waste vapour condenser with intensive separation of all vapour fractions that condense at cold water temperature and atmospheric pressure
These vacuum pump units provide reliable vacuum creation and control for many processes in the chemical laboratory. Ideal for applications with medium vacuum requirements, e.g. for all 'classic' solvents. The PC 511 has a manually controlled port and built-in non-return valves as well as the electronically controlled vacuum port to prevent separate processes from interfering with each other.
These vacuum pump units provide reliable vacuum creation and control for many processes in the chemical laboratory. Ideal for applications with medium vacuum requirements, e.g. for all 'classic' solvents. The PC 511 has a manually controlled port and built-in non-return valves as well as the electronically controlled vacuum port to prevent separate processes from interfering with each other.
This vacuum pump unit offers exceptional economy, with the capability to regulate two processes electronically at the same time and with two different levels of vacuum by means of two separate vacuum ports and vacuum controllers. Integral non-return valves to prevent the processes from interfering and contaminating each other. Cost-effective, space-saving solution for vacuum control of two independent processes.