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Toluene, CMOS for microelectronic, J.T.Baker®
  9466-03
 :  Avantor
 :  
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Toluene, CMOS for microelectronic, J.T.Baker®
  9466-03
 :  Avantor
 :  

 

  • Pk:
    4 L
  • Seq:
    5162
  • Environmentally Preferable:

 

 

  • For Microelectronic Use:
    = 99.5 %
  • Assay (C₆H₅CH₃) (by GC):
    ≥99.5 %
  • Color (APHA):
    ≤10
  • Acidity (µeq/g):
    ≤0.2
  • Residue after Evaporation:
    ≤2.0 ppm
  • Water (by KF, coulometric):
    ≤0.03 %
  • Substances Darkened by H₂SO₄:
    Passes Test
  • Sulfur Compounds (as S):
    ≤0.003 %
  • Chloride (Cl):
    ≤2 ppm
  • Phosphate (PO₄):
    ≤0.5 ppm
  • Trace Impurities - Aluminum (Al):
    ≤20 ppb
  • Arsenic and Antimony (as As):
    ≤10.0 ppb
  • Trace Impurities - Barium (Ba):
    ≤10.0 ppb
  • Trace Impurities - Boron (B):
    ≤20.0 ppb
  • Trace Impurities - Cadmium (Cd):
    ≤20.0 ppb
  • Trace Impurities - Calcium (Ca):
    ≤100.0 ppb
  • Trace Impurities - Chromium (Cr):
    ≤10.0 ppb
  • Trace Impurities - Cobalt (Co):
    ≤20 ppb
  • Trace Impurities - Copper (Cu):
    ≤20.0 ppb
  • Trace Impurities - Gallium (Ga):
    ≤50 ppb
  • Trace Impurities - Germanium (Ge):
    ≤50.0 ppb
  • Trace Impurities - Gold (Au):
    ≤20 ppb
  • Heavy Metals (as Pb):
    ≤500.0 ppb
  • Trace Impurities - Iron (Fe):
    ≤20.0 ppb
  • Trace Impurities - Lithium (Li):
    ≤20.0 ppb
  • Trace Impurities - Magnesium (Mg):
    ≤10.0 ppb
  • Trace Impurities - Manganese (Mn):
    ≤10.0 ppb
  • Trace Impurities - Nickel (Ni):
    ≤20.0 ppb
  • Trace Impurities - Potassium (K):
    ≤50 ppb
  • Trace Impurities - Silicon (Si):
    ≤100.0 ppb
  • Trace Impurities - Silver (Ag):
    ≤20.0 ppb
  • Trace Impurities - Sodium (Na):
    ≤100.0 ppb
  • Trace Impurities - Strontium (Sr):
    ≤10.0 ppb
  • Trace Impurities - Tin (Sn):
    ≤30.0 ppb
  • Trace Impurities - Zinc (Zn):
    ≤20.0 ppb
  • Particle Count - 1.0 µm and greater:
    ≤10 par/ml

 

 

 : Methylbenzene, Phenylmethane, FM approval
 :
 :92.14 g/mol
 :1294
 :3,II
 :108-88-3
 :C₆H₅CH₃
 :MFCD00008512