"Transene"

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Xylene (mixture of isomers) ≥99.50%, Low-Metal (LM) grade semiconductor grade

Supplier: Transene

Transene Xylenes solvent is a "low metals" chemical suitable for demanding semiconeuctor and elecrtronics processing.

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2-Propanol ≥99.80%, Low-Metal (LM) grade

Supplier: Transene

Transene Isopropyl Alcohol LM (synonyms include IPA, 2-propanol, and isopropanol) is a "low metals" alcohol suitable for demanding semiconductor and electronics processing. Effective for cleaning, degreasing, and other applications. Low water content.

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Indium tin oxyde (ITO) etchant TE-100 semiconductor grade

Supplier: Transene

ITO Etchant TE-100 is an effective etchant for indium tin oxide films. Will not harm glass substrates.

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Acetone ≥99.90%, Low-Metal (LM) grade semiconductor grade

Supplier: Transene

Transene Acetone LM grade is a "low metals" solvent suitable for electronics and semiconductor cleaning and processing. Low water content.

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Copper etchant 49-1 semiconductor grade

Supplier: Transene

Copper Etchant 49-1 is a highly selective, moderate etch rate copper etchant. Will not attack photoresist or other metals, including nickel.

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Copper etchant CE-100 semiconductor grade

Supplier: Transene

Copper Etchant CE-100 is a fast etch for removal of thicker copper films.

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Tetramethylammonium hydroxide 25% semiconductor grade

Supplier: Transene

Transene TMAH 25% is a "low metals" solution suitable for demanding semiconductor and electronics processing. Ready to use or dilutable for etching, stripping, and cleaning.

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Hydrochloric acid 37%, Low-Metal (LM) grade semiconductor grade

Supplier: Transene

Transene Hydrochloric Acid LM is a "low metals" HCl solution suitable for demanding semiconductor and electronics processing.

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Silver etchant TFS semiconductor grade

Supplier: Transene

Silver Etchant TFS is a fast etchant for silver films. Excellent photoresist compatibility.

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Aluminum etch TYPE A semiconductor grade

Supplier: Transene

Aluminum Etchant Type A is a traditional PAN etch for effective etching of aluminum films on silicon substrates. May also be used to etch alumina. Contains surfactant. Good photoresist compatibility.

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HMDS (1,1,1,3,3,3-hexamethyldisilazane) ≥100%, Low-Metal (LM) grade

Supplier: Transene

Transene Hexamethyldisilzane LM (HMDS) is an ultra-high purity, "low metals" adhesion promoter for photoresists and other photolithography applications.