"Transene"
Titanium etchant TFTN semiconductor grade
Supplier: Transene
Titanium Etchant TFTN is HF-free with a slow etch rate for fine line etching of titanium films. Will not attack glass/oxide.
Expand 2 Items
Buffered oxide etch 10:1 (BOE 10:1) semiconductor grade, with surfactant
Supplier: Transene
Buffered Oxide Etchant 10:1 with surfactant is a slower-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.
Expand 2 Items
Hydrofluoric acid 49%, Low-Metal (LM) grade semiconductor grade
Supplier: Transene
Transene Hydrofluoric Acid LM is a "low metals" HF solution suitable for demanding semiconductor and electronics processing. Fast removal of oxides and nitrides.
Expand 2 Items
Silver etchant TFS semiconductor grade
Supplier: Transene
Silver Etchant TFS is a fast etchant for silver films. Excellent photoresist compatibility.
Expand 2 Items
Aluminum etch TYPE A semiconductor grade
Supplier: Transene
Aluminum Etchant Type A is a traditional PAN etch for effective etching of aluminum films on silicon substrates. May also be used to etch alumina. Contains surfactant. Good photoresist compatibility.
Expand 2 Items
Copper etchant 49-1 semiconductor grade
Supplier: Transene
Copper Etchant 49-1 is a highly selective, moderate etch rate copper etchant. Will not attack photoresist or other metals, including nickel.
Expand 2 Items
HMDS (1,1,1,3,3,3-hexamethyldisilazane) ≥100%, Low-Metal (LM) grade
Supplier: Transene
Transene Hexamethyldisilzane LM (HMDS) is an ultra-high purity, "low metals" adhesion promoter for photoresists and other photolithography applications.
Expand 2 Items
Copper etchant CE-100 semiconductor grade
Supplier: Transene
Copper Etchant CE-100 is a fast etch for removal of thicker copper films.
Expand 2 Items
Tetramethylammonium hydroxide 25% semiconductor grade
Supplier: Transene
Transene TMAH 25% is a "low metals" solution suitable for demanding semiconductor and electronics processing. Ready to use or dilutable for etching, stripping, and cleaning.
Expand 2 Items
Hydrochloric acid 37%, Low-Metal (LM) grade semiconductor grade
Supplier: Transene
Transene Hydrochloric Acid LM is a "low metals" HCl solution suitable for demanding semiconductor and electronics processing.
Expand 2 Items
Gold entchant TFA semiconductor grade
Supplier: Transene
Gold Etchant TFA is a general purpose etchant for etching fine lines in gold thin films. Excellent photoresist compatibility. Suitable for gold bump processing. Gold Etchant TFA also etches nickel.
Expand 2 Items
Ammonia solution 29%, Low-Metal (LM) grade semiconductor grade
Supplier: Transene
Transene Ammonium Hydroxide 29% LM is a "low metals" grade suitable for semiconductor and electronics processing.
Expand 2 Items
Acetic acid ≥99.70%, Low-Metal (LM) grade semiconductor grade
Supplier: Transene
Transene Acetic Acid LM grade is a high-purity acetic acid suitable for semiconductor and elecrtonics applications. Low metal ion content is assured. Quart bottle.
Expand 2 Items
Titanium etchant TFT semiconductor grade
Supplier: Transene
Titanium Etchant TFT is a general purpose titanium etchant with a controlled etch rate.
Expand 2 Items
Hydrogen peroxide 30%, Low-Metal (LM) grade semiconductor grade
Supplier: Transene
Transene Hydrogen Peroxide LM is a "low metals" peroxide solution suitable for demanding semiconductor and electronics processing. Stabilizer is not needed at these low metal impurity levels.
Expand 2 Items
Nickel etchant TFG semiconductor grade
Supplier: Transene
Nickel Etchant TFG is a specially formulated etchant for electroless or electrolytic nickel films. May also be used for nickel vanadium (NiV) films or any nickel film containing non-nickel impurities. Will not attack gallium arsenide (GaAs).
Expand 2 Items
Recommendations will be personalized based on your shopping preferences only if you have given your consent by enabling "Enhance my Shopping Experience" on the "Personal Info page".
Otherwise, you will receive generic recommendations.