"Transene"
Sulphuric acid ≥96%, Low-Metal (LM) grade semiconductor grade
Supplier: Transene
Transene Sulfuric Acid LM is a "low metals" solution suitable for demanding semiconductor and electronics processing.
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N-Methyl-2-pyrrolidone (NMP), Low-Metal (LM) grade semiconductor grade
Supplier: Transene
NMP is suitable for a broad range of photoresist stripping applications.
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Buffered oxide etch 10:1 (BOE 10:1) semiconductor grade
Supplier: Transene
Buffered Oxide Etchant 10:1 is a reduced-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF.
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Buffered oxide etch 6:1 (BOE 6:1) semiconductor grade
Supplier: Transene
Buffered Oxide Etchant 6:1 is a moderate-speed etchant for oxide films. 6:1 ratio of ammonium fluoride: HF.
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Nitric acid 69.5-70%, Low-Metal (LM) grade semiconductor grade
Supplier: Transene
Transene Nitric Acid LM is a "low metals" nitric acid solution suitable for demanding semiconductor and electronics processing.
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Nickel etchant TFG semiconductor grade
Supplier: Transene
Nickel Etchant TFG is a specially formulated etchant for electroless or electrolytic nickel films. May also be used for nickel vanadium (NiV) films or any nickel film containing non-nickel impurities. Will not attack gallium arsenide (GaAs).
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Hydrogen peroxide 30%, Low-Metal (LM) grade semiconductor grade
Supplier: Transene
Transene Hydrogen Peroxide LM is a "low metals" peroxide solution suitable for demanding semiconductor and electronics processing. Stabilizer is not needed at these low metal impurity levels.
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Titanium etchant TFT semiconductor grade
Supplier: Transene
Titanium Etchant TFT is a general purpose titanium etchant with a controlled etch rate.
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Acetic acid ≥99.70%, Low-Metal (LM) grade semiconductor grade
Supplier: Transene
Transene Acetic Acid LM grade is a high-purity acetic acid suitable for semiconductor and elecrtonics applications. Low metal ion content is assured. Quart bottle.
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Ammonia solution 29%, Low-Metal (LM) grade semiconductor grade
Supplier: Transene
Transene Ammonium Hydroxide 29% LM is a "low metals" grade suitable for semiconductor and electronics processing.
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Gold entchant TFA semiconductor grade
Supplier: Transene
Gold Etchant TFA is a general purpose etchant for etching fine lines in gold thin films. Excellent photoresist compatibility. Suitable for gold bump processing. Gold Etchant TFA also etches nickel.
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Reagent semiconductor etchant RSE-100 semiconductor grade
Supplier: Transene
RSE-100 is a nitric/HF/acetic formulation for controlled anisotropic etching of amorphouse or crystalline silicon.
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Buffered oxide etch 6:1 (BOE 6:1) semiconductor grade, with surfactant
Supplier: Transene
Buffered Oxide Etchant 6:1 with surfactant is a moderate-speed etchant for oxide films. 6:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.
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Orthophosphoric acid ≥85%, Low-Metal (LM) grade semiconductor grade
Supplier: Transene
Transene Phosphoric Acid LM is a "low metals" phosphoric acid acid solution suitable for demanding semiconductor and electronics processing.
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Chromium etchant 1020AC semiconductor grade
Supplier: Transene
Chromium Etchant 1020AC is a slower etchant for chrome thin films or photomasks. Slower etch rate provides better control, enhanced fine-line definition, and compatibility with a broader range of materials and photoresists.
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Buffered oxide etch 10:1 (BOE 10:1) semiconductor grade, with surfactant
Supplier: Transene
Buffered Oxide Etchant 10:1 with surfactant is a slower-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.
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