372 Results for: "Transene"

Supplier: Transene

Transene Sulfuric Acid LM is a "low metals" solution suitable for demanding semiconductor and electronics processing.

Supplier: Transene

Transene Nitric Acid LM is a "low metals" nitric acid solution suitable for demanding semiconductor and electronics processing.

Supplier: Transene

Transene Hydrochloric Acid LM is a "low metals" HCl solution suitable for demanding semiconductor and electronics processing.

Supplier: Transene

NMP is suitable for a broad range of photoresist stripping applications.

Supplier: Transene

Buffered Oxide Etchant 10:1 is a reduced-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF.

Supplier: Transene

Buffered Oxide Etchant 6:1 with surfactant is a moderate-speed etchant for oxide films. 6:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.

Supplier: Transene

Chromium Etchant 1020AC is a slower etchant for chrome thin films or photomasks. Slower etch rate provides better control, enhanced fine-line definition, and compatibility with a broader range of materials and photoresists.

Supplier: Transene

Transene Phosphoric Acid LM is a "low metals" phosphoric acid acid solution suitable for demanding semiconductor and electronics processing.

Supplier: Transene

RSE-100 is a nitric/HF/acetic formulation for controlled anisotropic etching of amorphouse or crystalline silicon.

Supplier: Transene

Titanium Etchant TFTN is HF-free with a slow etch rate for fine line etching of titanium films. Will not attack glass/oxide.

Supplier: Transene

Transene Hydrofluoric Acid LM is a "low metals" HF solution suitable for demanding semiconductor and electronics processing. Fast removal of oxides and nitrides.

Supplier: Transene

Chromium Etchant 1020 is an excellent general purpose etchant for chrome thin films or photomasks.

Supplier: Transene

Palladium Etchant TFP is a non-cyanide formulation for controlled etching of palladium films.

Supplier: Transene

Buffered Oxide Etchant 10:1 with surfactant is a slower-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.

Supplier: Transene

Transene TMAH 25% is a "low metals" solution suitable for demanding semiconductor and electronics processing. Ready to use or dilutable for etching, stripping, and cleaning.

Supplier: Transene

Transene Hexamethyldisilzane LM (HMDS) is an ultra-high purity, "low metals" adhesion promoter for photoresists and other photolithography applications.

Supplier: Transene

Copper Etchant 49-1 is a highly selective, moderate etch rate copper etchant. Will not attack photoresist or other metals, including nickel.

Supplier: Transene

Copper Etchant CE-100 is a fast etch for removal of thicker copper films.

Supplier: Transene

Buffered Oxide Etchant 6:1 is a moderate-speed etchant for oxide films. 6:1 ratio of ammonium fluoride: HF.

Supplier: Transene

Aluminum Etchant Type A is a traditional PAN etch for effective etching of aluminum films on silicon substrates. May also be used to etch alumina. Contains surfactant. Good photoresist compatibility.

Supplier: Transene

Silver Etchant TFS is a fast etchant for silver films. Excellent photoresist compatibility.

Supplier: Transene

Transene Potassium Hydroxide 45% (KOH 45%) is a high purity solution suitable for demanding semiconductor and electronics process applications including stripping, cleaning, and etching.

Supplier: Transene

TRANSIST PD860 Positive Photoresist Kit is a collection of photolithography chemicals for high-resolution photopatterning for integrated circuit manufacture. The kit includes 1 pint of PD860 resist, 1 pint of thinner, 1 quart of rinse, 1 u

Supplier: Transene

Tantalum Etchant 111 provides controlled etching of tantalum, tantalum oxide, and tantalum nitride materials.

Supplier: Transene

Transene Ammonium Hydroxide 29% LM is a "low metals" grade suitable for semiconductor and electronics processing.

Supplier: Transene

Titanium Etchant TFT is a general purpose titanium etchant with a controlled etch rate.

Supplier: Transene

Gold Etchant TFA is a general purpose etchant for etching fine lines in gold thin films. Excellent photoresist compatibility. Suitable for gold bump processing. Gold Etchant TFA also etches nickel.

Supplier: Transene

Transene Hydrogen Peroxide LM is a "low metals" peroxide solution suitable for demanding semiconductor and electronics processing. Stabilizer is not needed at these low metal impurity levels.

Supplier: Transene

Nickel Etchant TFG is a specially formulated etchant for electroless or electrolytic nickel films. May also be used for nickel vanadium (NiV) films or any nickel film containing non-nickel impurities. Will not attack gallium arsenide (GaAs).

Supplier: Transene

Transene Acetic Acid LM grade is a high-purity acetic acid suitable for semiconductor and elecrtonics applications. Low metal ion content is assured. Quart bottle.