372 Results for: "Transene"

Supplier: Transene

NMP is suitable for a broad range of photoresist stripping applications.

Supplier: Transene

Transene Sulfuric Acid LM is a "low metals" solution suitable for demanding semiconductor and electronics processing.

Supplier: Transene

Buffered Oxide Etchant 10:1 is a reduced-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF.

Supplier: Transene

Transene Nitric Acid LM is a "low metals" nitric acid solution suitable for demanding semiconductor and electronics processing.

Supplier: Transene

Transene Hydrochloric Acid LM is a "low metals" HCl solution suitable for demanding semiconductor and electronics processing.

Supplier: Transene

Gold Etchant GE-8148 is a faster gold etchant designed to minimize attack on nickel. Excellent photoresist compatibility.

Supplier: Transene

Transene Xylenes solvent is a "low metals" chemical suitable for demanding semiconeuctor and elecrtronics processing.

Supplier: Transene

Copper Etchant APS-100 is an ammonium persulfate solution with excellent control for fine-line etching of copper films in integrated circuits.

Supplier: Transene

Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.

Supplier: Transene

Tantalum Etchant 111 provides controlled etching of tantalum, tantalum oxide, and tantalum nitride materials.

Supplier: Transene

Transene Potassium Hydroxide 45% (KOH 45%) is a high purity solution suitable for demanding semiconductor and electronics process applications including stripping, cleaning, and etching.

Supplier: Transene

TRANSIST PD860 Positive Photoresist Kit is a collection of photolithography chemicals for high-resolution photopatterning for integrated circuit manufacture. The kit includes 1 pint of PD860 resist, 1 pint of thinner, 1 quart of rinse, 1 u

Supplier: Transene

Chromium Etchant 1020AC is a slower etchant for chrome thin films or photomasks. Slower etch rate provides better control, enhanced fine-line definition, and compatibility with a broader range of materials and photoresists.

Supplier: Transene

RSE-100 is a nitric/HF/acetic formulation for controlled anisotropic etching of amorphouse or crystalline silicon.

Supplier: Transene

Buffered Oxide Etchant 6:1 with surfactant is a moderate-speed etchant for oxide films. 6:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.

Supplier: Transene

Transene Phosphoric Acid LM is a "low metals" phosphoric acid acid solution suitable for demanding semiconductor and electronics processing.

Supplier: Transene

Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.

Supplier: Transene

Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.

Supplier: Transene

Nickel Etchant TFB is an effective general purpose etchant for sputtered or evaporated pure nickel films.

Supplier: Transene

Nichrome Etchant TFN is an effective etchant for Ni-Cr thin films in integrated circuits. Good photoresist compatibilty.

Supplier: Transene

TRANSIST ND560 Negative Photoresist Kit is a collection of photolithography chemicals for high-resolution photopatterning for integrated circuit manufacture. The kit includes 1 pint of ND560 resist, 1 pint of thinner, 1 quart of rinse, 1 u

Supplier: Transene

Wright Etchant is the classic defect delineation etchant for silicon semiconductor substrates.

Supplier: Transene

Buffered Oxide Etchant 10:1 with surfactant is a slower-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.

Supplier: Transene

Chromium Etchant 1020 is an excellent general purpose etchant for chrome thin films or photomasks.

Supplier: Transene

Titanium Etchant TFTN is HF-free with a slow etch rate for fine line etching of titanium films. Will not attack glass/oxide.

Supplier: Transene

Palladium Etchant TFP is a non-cyanide formulation for controlled etching of palladium films.

Supplier: Transene

Transene Hydrofluoric Acid LM is a "low metals" HF solution suitable for demanding semiconductor and electronics processing. Fast removal of oxides and nitrides.

Supplier: Transene

Buffered Oxide Etchant 6:1 is a moderate-speed etchant for oxide films. 6:1 ratio of ammonium fluoride: HF.

Supplier: Transene

Aluminum Etchant Type A is a traditional PAN etch for effective etching of aluminum films on silicon substrates. May also be used to etch alumina. Contains surfactant. Good photoresist compatibility.

Supplier: Transene

Silver Etchant TFS is a fast etchant for silver films. Excellent photoresist compatibility.