98 Results for: "KMG"
Butyl acetate ≥99.50%
Supplier: KMG
n-Butyl acetate is used as a rinse for Polyimide processing or as a de-swelling agent for negative photoresist processing.
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HMDS (1,1,1,3,3,3-hexamethyldisilazane)
Supplier: KMG
HMDS is an adhesion promoter between the photoresist and the Silicon wafer
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Nano-Strip®
Supplier: KMG
Nano-Strip® is a stabilized formulation of sulfuric acid and hydrogen peroxide compounds. It removes positive and negative resists and other organic materials used in various applications of semiconductor photolithography. It contains high purity reagents required for high yield semiconductor manufacturing.
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MIXED ACID ETCHANT 9:1:0-ENTEGRIS PFA260
Supplier: KMG
MIXED ACID ETCHANT 9:1:0-ENTEGRIS PFA260
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BUFFERED OXIDE ETCH 20:1-POLY BOTTLE-17
Supplier: KMG
BUFFERED OXIDE ETCH 20:1-POLY BOTTLE-17
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GENSOLVE 670-POLY BOTTLE 160-16.7
Supplier: KMG
GENSOLVE 670-POLY BOTTLE 160-16.7
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PAD ETCH 4 XP-POLY BOTTLE-16.8
Supplier: KMG
PAD ETCH 4 XP-POLY BOTTLE-16.8
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MIXED ACID ETCHANT 2:1:0-ENTEGRIS PFA250
Supplier: KMG
MIXED ACID ETCHANT 2:1:0-ENTEGRIS PFA250
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N-METHYLPYRROLIDONE CR MB-CX BASE150-214
Supplier: KMG
N-METHYLPYRROLIDONE CR MB-CX BASE150-214
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ISOPROPANOL CR LP-CX BASE 150-158
Supplier: KMG
ISOPROPANOL CR LP-CX BASE 150-158
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ACETIC ACID CR LP-CX BASE 150-215
Supplier: KMG
ACETIC ACID CR LP-CX BASE 150-215
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ISOPROPANOL CR MB-CX BASE 150-158
Supplier: KMG
ISOPROPANOL CR MB-CX BASE 150-158
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ACETONE CR LP-CX BASE 150 -159
Supplier: KMG
ACETONE CR LP-CX BASE 150 -159
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SULFURIC ACID 96% GIGABIT-CX Y+ 150-350
Supplier: KMG
SULFURIC ACID 96% GIGABIT-CX Y+ 150-350
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AMMONIUM HYDROXIDE 29% CR MB-CX300-175
Supplier: KMG
AMMONIUM HYDROXIDE 29% CR MB-CX300-175
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HYDROCHLORIC ACID 37% CR LP 1190
Supplier: KMG
HYDROCHLORIC ACID 37% CR LP 1190
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HYDROFLUORIC ACID 49% CR MB 150-230
Supplier: KMG
HYDROFLUORIC ACID 49% CR MB 150-230
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HYDROGEN PEROXIDE CLASS 10 0.3 4LITER
Supplier: KMG
HYDROGEN PEROXIDE CLASS 10 0.3 4LITER
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METHANOL CR LP-CX BASE 150 -159
Supplier: KMG
METHANOL CR LP-CX BASE 150 -159
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POTASSIUM HYDROX 45%CR LP-CX BASE150-285
Supplier: KMG
POTASSIUM HYDROX 45%CR LP-CX BASE150-285
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SULFURIC ACID 96% CR MB-CX BASE 150-350
Supplier: KMG
SULFURIC ACID 96% CR MB-CX BASE 150-350
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SULFURIC ACID 54.5%-CX BASE 150-280
Supplier: KMG
SULFURIC ACID 54.5%-CX BASE 150-280
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ACETONE CR GIGABIT-CX BASE 150-159
Supplier: KMG
ACETONE CR GIGABIT-CX BASE 150-159
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HYDROGEN PEROXIDE 30% CR LP-CX 150-225
Supplier: KMG
HYDROGEN PEROXIDE 30% CR LP-CX 150-225
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PHOSPHORIC ACID 85% TERABIT-CX Y+150-345
Supplier: KMG
PHOSPHORIC ACID 85% TERABIT-CX Y+150-345
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MIXED ACID ETCH CL10 5:1:0POLYDRUM 525LB
Supplier: KMG
MIXED ACID ETCH CL10 5:1:0POLYDRUM 525LB
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ISOPROPANOL CR LP-STEEL DRUM-158
Supplier: KMG
ISOPROPANOL CR LP-STEEL DRUM-158