"KMG"
Hydrochloric acid 37% GB for the electronics industry
Supplier: KMG
Hydrochloric Acid is a key ingredient to remove surface metallic ions by forming soluble metal chlorides.
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Hydrochloric acid 37%, Cleanroom® LP for the electronics industry
Supplier: KMG
In semiconductor processing, the presence of metallic impurities on the wafer can lead to early dielectric breakdown. Hydrochloric acid is a key ingredient to remove surface metallic ions by forming soluble metal chlorides.
Storage: <80⁰ F
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Buffered oxide etch 50:1
Supplier: KMG
Buffered oxide etchants are used to etch thin films of silicon dioxide and shape contact and via openings.
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Acetone, Cleanroom® MB
Supplier: KMG
can be used for drying laboratory glassware, removing greasy or oily contaminants from work benches, or as a general photoresist stripper or edgebead remover.
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Potassium hydroxide 45% in aqueous solution, Cleanroom® LP for the electronics industry
Supplier: KMG
Potassium hydroxide (KOH) is used to etch silicon. The crystalline orientation of the silicon greatly affects the etch rate making potassium hydroxide an anisotropic etchant.
Storage: 32⁰ F - 120⁰ F
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Nano-Strip®
Supplier: KMG
Nano-Strip® is a stabilized formulation of sulfuric acid and hydrogen peroxide compounds. It removes positive and negative resists and other organic materials used in various applications of semiconductor photolithography. It contains high purity reagents required for high yield semiconductor manufacturing.
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