"KMG"
Ammonium fluoride 40% in aqueous solution MB
Supplier: KMG
Ammonium fluoride is used to dilute HF solutions for silicon dioxide film etching.
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Sulfuric acid ≥96%, Cleanroom® MB for the electronics industry
Supplier: KMG
Sulfuric acid is used in semiconductor processing to remove residual organic contamination prior to metalization steps.
Store at less than 109⁰ F
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Xylene (mixture of isomers) ≥99.00%
Supplier: KMG
Xylene can be used as a negative resist developer in semiconductor applications. Xylene is also mixed with HMDS, then spun on to a wafer to aid in adhesive of photoresist to the silicon wafer.
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2-Propanol ≥99.5%, Cleanroom® LP for the electronics industry
Supplier: KMG
IPA is used to rinse silicon wafers and to leave a clean dry residue free surface usually after organic stripping solutions
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Ammonia solution 29%, Cleanroom® MB for the electronics industry
Supplier: KMG
Ammonium hydroxide is used in a SC-1 solution to remove organics and particles from the surface of a wafer. The ammonium hydroxide allows undercutting of the silicon dioxide freeing particles from the wafer by lift-off.
Storage: 0⁰ F - 80⁰F
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Nitric acid 69.5%, Cleanroom® LP for the electronics industry
Supplier: KMG
Nitric acid is a strong oxidizing agent. Nitric acid is used to oxidize silicon to silicon dioxide and to dissolve metals to metal nitrates. Nitric acid is used in combination with HF in mixed acid etchants to etch silicon.
Storage: <75⁰ F
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2-Propanol ≥99.8%
Supplier: KMG
IPA is used to rinse silicon wafers and to leave a clean dry residue free surface usually after organic stripping solutions.
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Acetone, Cleanroom® MB
Supplier: KMG
can be used for drying laboratory glassware, removing greasy or oily contaminants from work benches, or as a general photoresist stripper or edgebead remover.
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Potassium hydroxide 45% in aqueous solution, Cleanroom® LP for the electronics industry
Supplier: KMG
Potassium hydroxide (KOH) is used to etch silicon. The crystalline orientation of the silicon greatly affects the etch rate making potassium hydroxide an anisotropic etchant.
Storage: 32⁰ F - 120⁰ F
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Hydrofluoric acid 49%, Cleanroom® MB for the electronics industry
Supplier: KMG
Hydrofluoric Acid 49% is used to soluabilize many oxides, particularly silicon dioxide, the most widely used insulator on semiconductor devices.
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N-Methyl-2-pyrrolidone (NMP), Cleanroom® MB for the electronics industry
Supplier: KMG
N-Methylpyrrolidone (NMP) is a safer alternative to many hazardous solvents. NMP can be used remove cured photoresist, clean and dewax silicon wafers, and remove solder flux on printed circuit boards.
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Sulfuric acid ≥96%, Gigabit®
Supplier: KMG
Sulfuric Acid is used in semiconductor processing to remove residual organic contamination prior to metalization steps.
Store at less than 109⁰ F
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Hydrochloric acid 37% GB for the electronics industry
Supplier: KMG
Hydrochloric Acid is a key ingredient to remove surface metallic ions by forming soluble metal chlorides.
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Hydrochloric acid 37%, Cleanroom® LP for the electronics industry
Supplier: KMG
In semiconductor processing, the presence of metallic impurities on the wafer can lead to early dielectric breakdown. Hydrochloric acid is a key ingredient to remove surface metallic ions by forming soluble metal chlorides.
Storage: <80⁰ F
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Buffered oxide etch 50:1
Supplier: KMG
Buffered oxide etchants are used to etch thin films of silicon dioxide and shape contact and via openings.
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Acetone ≥99.5%, Cleanroom® LP for the electronics industry
Supplier: KMG
Acetone ≥99.5%, Cleanroom® LP for the electronics industry
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