Aluminum etch TYPE A semiconductor grade
Corrosive
Toxic
Irritant
HealthAbout this item
Aluminum Etchant Type A is a traditional PAN etch for effective etching of aluminum films on silicon substrates. May also be used to etch alumina. Contains surfactant. Good photoresist compatibility.
- Boiling Pt:100 °C (water)
- Density:1.45 g/cc
- Storage Temperature:Ambient
- UN:3264
- ADR:8,II
2 Options Available Below
Product Details & Documents
Aluminum Etchant Type A is a traditional PAN etch for effective etching of aluminum films on silicon substrates. May also be used to etch alumina. Contains surfactant. Good photoresist compatibility.
- Boiling Pt:100 °C (water)
- Density:1.45 g/cc
- Storage Temperature:Ambient
- UN:3264
- ADR:8,II
Specifications for Product Family
Specification Test Results
- Appearance:Water-white to light yellow
- Etch Capacity (rate declines at ~70%):60 g/gallon
- Etch Rate at 25°C:30/sec Å/sec
- Etch Rate at 40°C:80/sec Å/sec
- Filtration:0,2 um
- Incompatible Materials:Aluminum oxide, silicon nitride
- pH:Strongly acidic
- Recommended Operating Temperatures:20-80°C (30-40°C most common) °C
- Shelf Life:1 year
- Storage Conditions:Ambient
Product Family Options
Product Information
- Pack typeSizeAvailabilityPrice
- Supplier Number: 0026000-QT
- HDPE bottleGallonEach (1US Gal)$145.60Case of 4 (1 US Gal)$582.40Supplier Number: 0026000-GAL
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