Betapure™ CMP filter cartridges are high capacity depth filters optimized for oxide and metal slurries used in chemical mechanical planarization (CMP) applications. Betapure CMP filters are composed of all–polypropylene components and features a multi–zone 'graded–porosity' design for the optimum level of particle classification.

• Graded porosity design for superior slurry classification
• Reduces large particle counts (LPC) that cause equipment damage and decreased yields
• All polypropylene depth filter capsules allow for broad chemical and temperature compatibility
• Quality manufacturing validated by ISO certified quality management system
• Built to exacting specifications to provide consistency and process repeatability
• Manufactured and double–bagged in a clean environment to provide superior downstream cleanliness out of the package
• Provides a consistent quality of slurry enabling repeatability of the planarization process

It effectively reduces LPC's that can cause equipment damage and potentially reduce yields while maintaining the polishing characteristics of the slurry. The 100% polypropylene materials offer broad temperature and chemical compatibility, which provides durability throughout demanding process applications.

Recommended Applications: Semiconductor, Oxide/Low–k dielectrics, Shallow Trench Isolation (STI), Inter–level Dielectric (ILD), Polysilicon, Tungsten and copper, Data Storage, Magnetic heads, Nickel and glass substrates, Data Transmission, Optical fiber, Compound Semiconductor, Light Emitting Diodes (LED).