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21 results for Tetramethylammonium hydroxide

You searched for: Tetramethylammonium hydroxide

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Tetramethylammonium hydroxide 25% in water, Finyte®, J.T.Baker®

Tetramethylammonium hydroxide 25% in water, Finyte®, J.T.Baker®

Supplier: AVANTOR PERFORMANCE MATERIALS US

Tetramethylammonium Hydroxide (25% in H2O), Finyte®

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Tetramethylammonium hydroxide 10% in aqueous solution, BAKER ANALYZED®, J.T.Baker®

Tetramethylammonium hydroxide 10% in aqueous solution, BAKER ANALYZED®, J.T.Baker®

Supplier: AVANTOR PERFORMANCE MATERIALS US

Tetramethylammonium Hydroxide (10% in H2O), BAKER ANALYZED® Reagent

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Tetramethylammonium hydroxide 10% (w/w) in aqueous solution

Tetramethylammonium hydroxide 10% (w/w) in aqueous solution

Supplier: Ricca Chemical

Tetramethylammonium Hydroxide, 10% w/w, Container: amber glass, Size: 500ml

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Tetramethylammonium hydroxide 25% in water

Tetramethylammonium hydroxide 25% in water

Supplier: Thermo Scientific Chemicals

Tetramethylammonium hydroxide 25% in water

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Tetramethylammonium hydroxide 25% (w/w) in methanol

Tetramethylammonium hydroxide 25% (w/w) in methanol

Supplier: Thermo Scientific Chemicals

Tetramethylammonium hydroxide 25% (w/w) in methanol

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Tetramethylammonium hydroxide ∼25% in water

Supplier: TCI America

CAS Number: 75-59-2
MDL Number: MFCD00008280
Molecular Formula: C4H13NO
Molecular Weight: 91.15
Form: Clear Liquid
Color: Colorless

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Tetramethylammonium hydroxide 10% in water

Supplier: Thermo Scientific Chemicals

Tetramethylammonium hydroxide 10% in water

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Tetramethylammonium hydroxide 10% in water

Supplier: TCI America

CAS Number: 75-59-2
MDL Number: MFCD00008280
Molecular Formula: C4H13NO
Molecular Weight: 91.15
Form: Clear Liquid
Color: Colorless
Flash Point (°C): 37

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Tetramethylammonium hydroxide 25% (w/w) in aqueous solution , 99,9999% (metals basis), Electronic Grade

Supplier: Thermo Scientific Chemicals

MDL: MFCD00008280 Beilstein Registry No.: 3558708

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Tetramethylammonium hydroxide 10% in methanol

Supplier: TCI America

CAS Number: 75-59-2
MDL Number: MFCD00008280
Molecular Formula: C4H13NO
Molecular Weight: 91.15
Form: Clear Liquid
Color: Colorless
Flash Point (°C): 12
Specific Gravity (20/20): 0.84

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Tetramethylammonium hydroxide 2,14% semiconductor grade NOVO DEVELOPER 842

Supplier: Transene

Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.

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Tetramethylammonium hydroxide 0.1 M (CH3)4NOH (0.1N) in 2-propanol/methanol volumetric solution, for titration in non-aqueous media, Fluka™

Supplier: Honeywell Research Chemicals

Tetramethylammonium hydroxide solution, Volumetric, concentration: 0.1 M (CH3)4NOH in isopropanol/methanol (0.1N), for titration in non-aqueous medium, CAS number: 75-59-2, Molecular formula: (CH3)4N(OH), form: liquid, Size: 1L

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Tetramethylammonium hydroxide 1.0 M in water ACS

Supplier: BeanTown Chemical

CAS: 75-59-2; EC No: 200-882-9; MDL No: MFCD00008280 UN No: UN1835; Haz Class: 8; Packing Group: III Liquid; Linear Formula: (CH3)4NOH ; Molecular Formula: C4H13NO; MW: 91.15 Air Sensitive

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Tetramethylammonium hydroxide 0.26 N semiconductor grade NOVO DEVELOPER 26

Supplier: Transene

Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.

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Tetramethylammonium hydroxide 2,38% semiconductor grade NOVO DEVELOPER 342

Supplier: Transene

Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.

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Tetramethylammonium hydroxide 25% (w/w) in methanol

Supplier: Thermo Scientific Chemicals

MDL: MFCD00008280

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Tetramethylammonium hydroxide 25% (w/w) in water , 99,999% (trace metals basis)

Supplier: BeanTown Chemical

CAS: 75-59-2; EC No: 200-882-9; MDL No: MFCD00008280 UN No: UN1835; Haz Class: 8; Packing Group: II Liquid; Linear Formula: (CH3)4NOH ; Molecular Formula: C4H13NO; MW: 91.15 Boiling Point: 102°; Flash point: 100°C (212°F) Refractive Index: 1.381 Air Sensitive

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Tetramethylammonium hydroxide 25% semiconductor grade

Supplier: Transene

Transene TMAH 25% is a "low metals" solution suitable for demanding semiconductor and electronics processing. Ready to use or dilutable for etching, stripping, and cleaning.

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