You searched for: Cloning Buffers
In molecular biology, cloning buffer solutions containing TRIS, acetic acid, EDTA, or more are used in agarose electrophoresis, typically for the separation of nucleic acids such as DNA and RNA. Various buffer formulations are available with different base ingredients in the mixture. These different mixtures have varied buffer capacities and run times. Buffer solutions serve to protect samples against pH changes while the sample is undergoing a wide variety of chemical applications.
Buffer, TRIS solution pH 7,6 (1 mol/L), Sigma-Aldrich®
Supplier: Merck
Cloning Buffer, TRIS buffer solution pH 7,6 (1 mol/l)
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Ambion® buffer, potassium acetate, 3M™ solution, pH 5,5, RNase-free, Invitrogen™
Supplier: Ambion
Cloning Buffer, Potassium acetate buffer solution pH 5,5 (3 mol/l)
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Buffer, TE solution (TRIS-EDTA buffer) pH 8,0
Supplier: Molekula
Cloning Buffer, TE buffer solution (TRIS-EDTA buffer) pH 8,0
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Ambion® Buffer, EDTA buffer solution pH 8,0 (0,5 mol/l), Invitrogen™
Supplier: Ambion
Cloning Buffer, EDTA buffer solution pH 8,0 (0,5 mol/l)
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Ambion® Buffer, TE solution (TRIS-EDTA buffer), RNase-free, Invitrogen™
Supplier: Ambion
Cloning Buffer, TE buffer solution (TRIS-EDTA buffer)
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Ambion® Buffer, TE solution (TRIS-EDTA buffer) pH 8,0, RNase-free, Invitrogen™
Supplier: Ambion
Cloning Buffer, TE buffer solution (TRIS-EDTA buffer) pH 8,0
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Buffer, TE solution 100x concentrate (TRIS-EDTA buffer) pH 8,0
Supplier: Molekula
Cloning Buffer, TE buffer solution 100x concentrate (TRIS-EDTA buffer) pH 8,0
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Ambion® buffer, sodium acetate buffer solution pH 5,5 (3 mol/L), RNase-free, Invitrogen™
Supplier: Ambion
Cloning Buffer, Sodium acetate buffer solution pH 5,5 (3 mol/l)
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Buffer, TE solution (TRIS-EDTA buffer) pH 7,5
Supplier: Molekula
Cloning Buffer, TE buffer solution (TRIS-EDTA buffer) pH 7,5
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: KIMBERLY CLARK
: Integra
: Industrial Physics
: TESTO
: Integra
: VWR Collection
: VWR Collection
: VWR Collection
: Thermo Fisher Scientific
: VWR Collection
: VWR Collection
: Integra
: VWR Collection
: VWR Collection
: Industrial Physics