Silicon(IV) nitride, MgO binder, sputtering target ≥99.9% (metals basis), Ø 76.2 mm (3.0 in), Thickness: 3.18 mm (0.125 in)

41090.KS

Silicon(IV) nitride, MgO binder, sputtering target ≥99.9% (metals basis), Ø 76.2 mm (3.0 in), Thickness: 3.18 mm (0.125 in)

41090.KS

:Si₃N₄

:MFCD00011230

:140.28 g/mol

:Ambient

:234-796-8