Tantalum(V) oxide ≥99.9% (metals basis), sputtering target 76.2 mm (3.0 in) Ø x 3.18 mm (0.125 in) thick
41103.KS
:
- Pk:1
- Seq:0001
:
:14,09056
:1870…1880 °C
:8.2 g/cm³ (20 °C)
:441.89 g/mol
:215-238-2
:1314-61-0
:O₅Ta₂
:MFCD00011254