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Ethylene glycol, CMOS for microelectronic, J.T.Baker®
  9356-09
 :  Avantor
 :  
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Ethylene glycol, CMOS for microelectronic, J.T.Baker®
  9356-09
 :  Avantor
 :  

 

  • Pk:
    500 lb
  • Seq:
    7323

 

 

  • Assay (HOCH₂CH₂OH) (by GC):
    ≥99.0 %
  • Color (APHA):
    ≤10
  • Acidity (µeq/g):
    ≤0.8
  • Acidity (as CH₃COOH)(by wt):
    ≤0.01 %
  • Residue after Ignition:
    ≤0.005 %
  • Water (H₂O)(by Karl Fischer titrn):
    ≤0.2 %
  • Chloride (Cl):
    ≤1 ppm
  • Phosphate (PO₄):
    ≤2 ppm
  • Sulfate (SO₄):
    ≤2 ppm
  • Arsenic and Antimony (as As):
    ≤0.100 ppm
  • Trace Impurities - Aluminum (Al):
    ≤100.0 ppb
  • Trace Impurities - Barium (Ba):
    ≤100.0 ppb
  • Trace Impurities - Boron (B):
    ≤50 ppb
  • Trace Impurities - Calcium (Ca):
    ≤300 ppb
  • Trace Impurities - Chromium (Cr):
    ≤50 ppb
  • Trace Impurities - Copper (Cu):
    ≤10.0 ppb
  • Trace Impurities - Gold (Au):
    ≤50 ppb
  • Trace Impurities - Iron (Fe):
    ≤200.0 ppb
  • Trace Impurities - Lead (Pb):
    ≤200.0 ppb
  • Trace Impurities - Lithium (Li):
    ≤100.0 ppb
  • Trace Impurities - Magnesium (Mg):
    ≤100.0 ppb
  • Trace Impurities - Manganese (Mn):
    ≤100.0 ppb
  • Trace Impurities - Nickel (Ni):
    ≤100.0 ppb
  • Trace Impurities - Potassium (K):
    ≤300.0 ppb
  • Trace Impurities - Sodium (Na):
    ≤300 ppb
  • Trace Impurities - Tin (Sn):
    ≤100 ppb
  • Trace Impurities - Titanium (Ti):
    ≤100.0 ppb
  • Trace Impurities - Zinc (Zn):
    ≤400.0 ppb
  • Particle Count - 0.5 µm and greater:
    ≤200 par/ml

 

 

 :
 :62.07 g/mol
 :107-21-1
 :HOCH₂CH₂OH
 :MFCD00002885