"AVANTOR PERFORMANCE MATERIALS MX"
Acetone ≥99.5% (by GC, corrected for water content), CMOS for microelectronic, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
Acetone ≥99.5% (by GC, corrected for water content), CMOS for microelectronic, J.T.Baker®
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Hydrochloric acid 36,5 - 38,0% NF, Multi-Compendial, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
Corrosive liquid.
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Silver nitrate 0.1 mol/l (0.1 N) in aqueous solution, BAKER ANALYZED® volumetric solution, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
J.T.Baker® volumetric and analytical solutions. These solutions are suitable for use in ACS, USP and NF compendial methods and general laboratory applications.
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Toluene ≥99.5% (by GC), BAKER ANANYZED™ ACS Reagent
Supplier: AVANTOR PERFORMANCE MATERIALS MX
Lot analysis on label.
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Sodium hydroxide 0.1 N, BAKER ANALYZED® volumetric solution, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
J.T.Baker® volumetric and analytical solutions. These solutions are suitable for use in ACS, USP and NF compendial methods and general laboratory applications.
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Hydrochloric acid 32 - 35%, ULTREX® II, Ultrapure for trace metal analysis, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
Certificate of lot analysis provided.
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Acetone ≥99.4% (by GC, corrected for water content), ULTRA RESI-ANALYZED™, ACS Reagent for gas chromatography, for pesticide residue analysis, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
BAKER ULTRA RESI-ANALYZED® Reagent—ultra high-purity solvents and salts developed for organic residue extraction/concentration procedures. These solvents are fully characterized and lot controlled by ECD, FID, or other method-specific detectors. Advanced stabilizer systems are incorporated to ensure solvent stability and superior performance Solvents are suitable for exacting EPA sample cleanup protocols.
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Sulphuric acid 93-98%, ULTREX® II, Ultrapure, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
Sulphuric acid 93-98%, ULTREX® II, Ultrapure, J.T.Baker®
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Sulphuric acid ≥95%, BAKER INSTRA-ANALYZED® for trace metal analysis, for trace metal analysis low Selenium, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
The quality of BAKER ANALYZED™ ACS Reagents meets or exceeds the requirements set forth by the American Chemical Society (ACS). These acids are tested for common trace metals.
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Hydrochloric acid 0.1 N, BAKER ANALYZED® volumetric solution, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
J.T.Baker® volumetric and analytical solutions. These solutions are suitable for use in ACS, USP and NF compendial methods and general laboratory applications.
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Sodium acetate, anhydrous ≥99.0%, BAKER ANALYZED® ACS, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
Lot analysis on label.
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Acetic acid glacial ≥99.7% (by GC, corrected for water content), BAKER ANALYZED® A.C.S. Reagent ACS Reagent aldehyde-free, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
The quality of BAKER ANALYZED™ ACS Reagents meets or exceeds the requirements set forth by the American Chemical Society (ACS). These acids are tested for common trace metals.
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2-Propanol ≥99.7%, BAKER ANALYZED® HPLC for HPLC, for spectrophotometry, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
For high performance liquid chromatography. UV cutoff at 205nm. Lot analysis on label.
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Hydrochloric acid 36,5 - 38,0%, BAKER ANANYZED™ ACS Reagent, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
Lot analysis on label.
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Acetonitrile ≥99.9% (by GC) for HPLC, for spectrophotometry, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
BAKER ANALYZED™ HPLC Reagent—High purity solvents for use in analytical and preparative separations. All are optimized for all of your Liquid Chromatography applications, including HPLC, UHPLC, gel permeation chromatography and UV-spectrophotometric analysis.
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Acetone ≥99.3% (by GC), BAKER ANALYZED® HPLC for HPLC, UHPLC, for spectrophotometry, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIALS MX
Packaged under nitrogen. Filtered through a 0.2µm filter to remove particulate matter. UV cutoff 330nm. Lot analysis on label.
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