Acetone, CMOS for microelectronic, J.T.Baker®

사양 테스트 결과

• For Microelectronic Use:
  = 99.5 %
• Assay ((CH₃)₂CO) (by GC, corrected for water):
  ≥ 99.5 %
• Color (APHA):
  ≤ 10
• Residue after Evaporation:
  ≤ 5 ppm
• Titrable Acid (µeq/g):
  ≤ 0.3
• Titrable Base (µeq/g):
  ≤ 0.5
• Water (H₂O):
  ≤ 0.5 %
• Solubility in H₂O:
  Passes Test
• Chloride (Cl):
  ≤ 0.2 ppm
• Phosphate (PO₄):
  ≤ 0.05 ppm
• Trace Impurities - Aluminum (Al):
  ≤ 50.0 ppb
• Arsenic and Antimony (as As):
  ≤ 5.0 ppb
• Trace Impurities - Barium (Ba):
  ≤ 20.0 ppb
• Trace Impurities - Beryllium (Be):
  ≤ 10.0 ppb
• Trace Impurities - Bismuth (Bi):
  ≤ 20.0 ppb
• Trace Impurities - Boron (B):
  ≤ 10.0 ppb
• Trace Impurities - Cadmium (Cd):
  ≤ 10.0 ppb
• Trace Impurities - Calcium (Ca):
  ≤ 25.0 ppb
• Trace Impurities - Chromium (Cr):
  ≤ 10.0 ppb
• Trace Impurities - Cobalt (Co):
  ≤ 10.0 ppb
• Trace Impurities - Copper (Cu):
  ≤ 10.0 ppb
• Trace Impurities - Gallium (Ga):
  ≤ 10.0 ppb
• Trace Impurities - Germanium (Ge):
  ≤ 10.0 ppb
• Trace Impurities - Gold (Au):
  ≤ 20 ppb
• Trace Impurities - Iron (Fe):
  ≤ 20.0 ppb
• Trace Impurities - Lead (Pb):
  ≤ 10.0 ppb
• Trace Impurities - Lithium (Li):
  ≤ 10.0 ppb
• Trace Impurities - Magnesium (Mg):
  ≤ 20 ppb
• Trace Impurities - Manganese (Mn):
  ≤ 10.0 ppb
• Trace Impurities - Molybdenum (Mo):
  ≤ 10.0 ppb
• Trace Impurities - Nickel (Ni):
  ≤ 10.0 ppb
• Trace Impurities - Niobium (Nb):
  ≤ 50.0 ppb
• Trace Impurities - Potassium (K):
  ≤ 10.0 ppb
• Trace Impurities - Silicon (Si):
  ≤ 50 ppb
• Trace Impurities - Silver (Ag):
  ≤ 10.0 ppb
• Trace Impurities - Sodium (Na):
  ≤ 10.0 ppb
• Trace Impurities - Strontium (Sr):
  ≤ 10.0 ppb
• Trace Impurities - Tantalum (Ta):
  ≤ 50.0 ppb
• Trace Impurities - Thallium (Tl):
  ≤ 10.0 ppb
• Trace Impurities - Tin (Sn):
  ≤ 20.0 ppb
• Trace Impurities - Titanium (Ti):
  ≤ 10.0 ppb
• Trace Impurities - Vanadium (V):
  ≤ 10.0 ppb
• Trace Impurities - Zinc (Zn):
  ≤ 20.0 ppb
• Trace Impurities - Zirconium (Zr):
  ≤ 10.0 ppb
• Particle Count at point of fill - 0.5 µm and greater (Rion KS42AF or equivalent):
  ≤ 150 par/ml
• Particle Count at point of fill - 1.0 µm and greater (Rion KS42AF or equivalent):
  ≤ 25 par/ml