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36 results for 2-Propanol

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2-Propanol, AR®, Laboratory Reagent, Macron Fine Chemicals™

Supplier: MACRON AVANTOR BRAND

2-Propanol, AR®, Laboratory Reagent, Macron Fine Chemicals™

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2-Propanol ≥99.9%, CMOS, J.T.Baker®

2-Propanol ≥99.9%, CMOS, J.T.Baker®

Supplier: Avantor

2-Propanol ≥99.9%, CMOS, J.T.Baker®

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2-Propanol ≥99.5%, ChromAR® for liquid chromatography, for UV spectrophotometry, Macron Fine Chemicals™

2-Propanol ≥99.5%, ChromAR® for liquid chromatography, for UV spectrophotometry, Macron Fine Chemicals™

Supplier: MACRON AVANTOR BRAND

ChromAR®—Solvents that meet ACS specifications and are suitable for liquid chromatography and UV-spectrophotometry. 

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2-Propanol, anhydrous (max. 0.003% H₂O) ≥99.8%

2-Propanol, anhydrous (max. 0.003% H₂O) ≥99.8%

Supplier: VWR Chemicals

250 ml bottle with a septum cap featuring six separate re-sealable puncture points

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2-Propanol, Finyte® for microelectronic, J.T.Baker®

2-Propanol, Finyte® for microelectronic, J.T.Baker®

Supplier: Avantor

In the Avantor Electronic Materials range, we have solvents, acids and bases in CMOS and Finyte/VLSI quality, as well as Performance Materials like photoresist- and residue-removers, selective etchants, BEOL and FEOL.
Avantor Performance Materials portfolio of production-proven chemistries, customizable chemistry platforms and world-class applications centers are designed to help you meet your process improvement goals faster and speed up your ramp time to the next node.

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2-Propanol ≥99.9%, Finyte® for microelectronic, J.T.Baker®

2-Propanol ≥99.9%, Finyte® for microelectronic, J.T.Baker®

Supplier: Avantor

In the Avantor Electronic Materials range, we have solvents, acids and bases in CMOS and Finyte/VLSI quality, as well as Performance Materials like photoresist- and residue-removers, selective etchants, BEOL and FEOL.
Avantor Performance Materials portfolio of production-proven chemistries, customizable chemistry platforms and world-class applications centers are designed to help you meet your process improvement goals faster and speed up your ramp time to the next node.

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