Point of use photochemical filters, Optimizer®
Supplier: ENTEGRIS
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About this item
Liquid photochemical filters designed for developer, DI water and solvent applications in POU photolithography processes.
- Advanced filtration media: optimises filtration and particle retention capabilities
- UPE membrane spontaneously wets and stays wet in solvents
Membrane: Patented surface-modified hydrophilic ultra-high molecular weight polyethylene (UPE); Supports, core and sleeve: HDPE; Housing: PP
Maximum operating temperature: 40 °C
Maximum inlet pressure: 3,9 bar at 25 °C
Maximum forward/reverse pressure: 2,8 bar at 25 °C
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