Hydrofluoric acid, CMOS for microelectronic, J.T.Baker®
5477-03
: Avantor
:
- Pk:8,5 lb
- Seq:7077
- Assay (HF) (by acidimetry):1.05 - 1.15 %
- Color (APHA):≤10
- Fluosilicic Acid (H₂SiF₆):≤0.010 %
- Residue after Ignition:≤1 ppm
- Chloride (Cl):≤4 ppm
- Nitrate (NO₃):≤3 ppm
- Phosphate (PO₄):≤0.7 ppm
- Sulfate and Sulfite (as SO₄):≤3 ppm
- Trace Impurities - Aluminum (Al):≤50.0 ppb
- Arsenic and Antimony (as As):≤30.0 ppb
- Trace Impurities - Barium (Ba):≤20.0 ppb
- Trace Impurities - Boron (B):≤50 ppb
- Trace Impurities - Cadmium (Cd):≤20.0 ppb
- Trace Impurities - Calcium (Ca):≤80 ppb
- Trace Impurities - Chromium (Cr):≤10.0 ppb
- Trace Impurities - Cobalt (Co):≤20 ppb
- Trace Impurities - Copper (Cu):≤20.0 ppb
- Trace Impurities - Gallium (Ga):≤20.0 ppb
- Trace Impurities - Germanium (Ge):≤50.0 ppb
- Trace Impurities - Gold (Au):≤20 ppb
- Heavy Metals (as Pb):≤50.0 ppb
- Trace Impurities - Iron (Fe):≤80.0 ppb
- Trace Impurities - Lead (Pb):≤100 ppb
- Trace Impurities - Lithium (Li):≤20.0 ppb
- Trace Impurities - Magnesium (Mg):≤50.0 ppb
- Trace Impurities - Manganese (Mn):≤20.0 ppb
- Trace Impurities - Nickel (Ni):≤20.0 ppb
- Trace Impurities - Potassium (K):≤100 ppb
- Trace Impurities - Silicon (Si):≤1000.0 ppb
- Trace Impurities - Silver (Ag):≤10.0 ppb
- Trace Impurities - Sodium (Na):≤100.0 ppb
- Trace Impurities - Strontium (Sr):≤20.0 ppb
- Trace Impurities - Tin (Sn):≤50 ppb
- Trace Impurities - Titanium (Ti):≤300.0 ppb
- Trace Impurities - Zinc (Zn):≤50 ppb
- Particle Count - 1.0 µm and greater:≤10 par/ml
:
:20.01 g/mol
:1790
:8,I
:7664-39-3
:HF
:MFCD00011346