Superior retention performance for ultra-clean, point-of-use filtration of photoresist and photochemical solvents.

• Spontaneously wets in butyl acetate, PGMEA, PGME, ethyl lactate, MMP, cyclohexanone, ECA, NMP and other photochemical solvents
• Optimised for POU filtration of photoresist and photochemical solvents and aqueous chemicals

Membrane: UPE, nylon, PCM; Support: HDPE

Maximum operating temperature: 40 °C

Maximum forward/reverse differential pressure: 2,7 bar at 25 °C

Compatibility: PGMEA, PGME, NMP, ethyl lactate, MMP and cyclohexanone. Not recommended for use with photochemicals containing aromatic hydrocarbons.