These filters provide superior filtration for critical dilute, aqueous and low neutral pH cleaning applications at advanced technology nodes. The clean, dual capture membrane improves process performance and reduces on-wafer defects. In addition to sieving particle capture which is always active, the non sieving retention mechanisms are also active and strongest in conditions where pH is <3 and no surfactant is present.

• Hydrophilic membrane - no prewetting or flushing required
• Rapid particle removal and microbubble control for faster bath startup/system qualification and increased yields

Membrane: Hydrophilic ultra-high molecular weight PE (UPE); Supports, core and sleeve: HDPE

Maximum operating temperature: 70 °C

Maximum forward differential pressure: 3,4 bar at 25 °C

Maximum reverse differential pressure: 2,1 bar at 25 °C