Silicon ≥99.999% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)
40890.KS
:
- Pk:1
- Seq:0001
:7440-21-3
:
:Si
:MFCD00085311
:28.09 g/mol
:12,08635
:2355 °C (1013 hPa)
:1410 °C
:2.34 g/cm³ (20 °C)
:Ambient
:231-130-8