Silicon ≥99.999% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in) | Silicon

Silicon ≥99.999% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)

40890.KS

: Thermo Fisher Scientific

:

Silicon ≥99.999% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)

40890.KS

: Thermo Fisher Scientific

:

Pk:
1
Seq:
0001

:7440-21-3

:

:Si

:MFCD00085311

:28.09 g/mol

:12,08635

:2355 °C (1013 hPa)

:1410 °C

:2.34 g/cm³ (20 °C)

:Ambient

:231-130-8