Tantalum ≥99.95% (metals basis excluding Nb), sputtering target 76.2 mm (3.0 in) Ø x 3.18 mm (0.125 in) thick,
40896.KS
:
- Pk:1
- Seq:0001
:
:180.95 g/mol
:12,09223
:5427 °C (1013 hPa)
:2996 °C
:16.69 g/cm³ (20 °C)
:231-135-5
:7440-25-7
:Ta
:MFCD00011252