Silikagel ≥99.995% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 6.35 mm (0.250 in) | Silicon dioxide

Silikagel ≥99.995% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 6.35 mm (0.250 in)

41097.KS

: Thermo Fisher Scientific

:

Silikagel ≥99.995% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 6.35 mm (0.250 in)

41097.KS

: Thermo Fisher Scientific

:

Bal.:
1
Sekvence:
0001

:7631-86-9

:

:SiO₂

:MFCD00011232

:14,08493

:2230 °C (1013 hPa)

:1719 °C

:2,2 g/cm³ (20 °C)

:Ambient

:231-545-4

:14808-60-7