氨水 分析级
氨水 分析级 25%, GPR RECTAPUR®
Supplier: VWR Chemicals
氨水 分析级 25%, GPR RECTAPUR®
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氨水 分析级 29%, CMOS for microelectronic, J.T.Baker®
Supplier: Avantor
氨水 分析级 29%, CMOS for microelectronic, J.T.Baker®
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氨水 分析级 29%, Finyte® for microelectronic, J.T.Baker®
Supplier: Avantor
氨水 分析级 29%, Finyte® for microelectronic, J.T.Baker®
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氨水 分析级 28,0 - 30,0 % (NH₃ basis), CMOS for microelectronic, J.T.Baker®
Supplier: Avantor
氨水 分析级 28,0 - 30,0 % (NH₃ basis), CMOS for microelectronic, J.T.Baker®
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氨水 分析级 25 - 27%, NORMATOM® for trace analysis
Supplier: VWR Chemicals
氨水 分析级 25 - 27%, NORMATOM® for trace analysis
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氨水 分析级 28 - 30% VLSI for the electronics industry, J.T.Baker®
Supplier: Avantor
氨水 分析级 28 - 30% VLSI for the electronics industry, J.T.Baker®
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氨水 分析级 ∼32%, GPR RECTAPUR®
Supplier: VWR Chemicals
氨水 分析级 ∼32%, GPR RECTAPUR®
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氨水 分析级 20%, NORMATOM®, Ultrapure for trace metal analysis
Supplier: VWR Chemicals
氨水 分析级 20%, NORMATOM®, Ultrapure for trace metal analysis
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氨水 分析级 USP Test Solution (TS) 34
Supplier: VWR Chemicals
Ready to use test solutions (TS).
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氨水 分析级 28,0 - 30,0% （基于NH₃）, AR® ACS (26° Baume), Macron Fine Chemicals™
Supplier: MACRON AVANTOR BRAND
氨水 分析级 28,0 - 30,0% (NH₃ basis), AR® ACS (26° Baume), Macron Fine Chemicals™
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氨水 分析级 28,0 - 30,0% (NH₃ basis), AR Select® ACS for trace metal analysis, Macron Fine Chemicals™
Supplier: MACRON AVANTOR BRAND
AR Select® - A line of acids specifically developed for trace metal analysis; analysed for up to 32 metals in the low ppb range.
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氨水 分析级 0.1 mol/l (0.1 N) Reag. Ph. Eur. 1004704
Supplier: VWR Chemicals
氨水 分析级 0.1 mol/l (0.1 N) Reag. Ph. Eur. 1004704
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氨水 分析级 30%, BAKER INSTRA-ANALYZED® for trace metal analysis, J.T.Baker®
Supplier: Avantor
For trace metal analysis. Lot analysis on label.
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氨水 分析级 20%, BAKER INSTRA-ANALYZED® Plus for trace metal analysis, J.T.Baker®
Supplier: Avantor
氨水 分析级 20%, BAKER INSTRA-ANALYZED® Plus for trace metal analysis, J.T.Baker®
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氨水 分析级 10%, AnalaR NORMAPUR®
Supplier: VWR Chemicals
氨水 分析级 10%, AnalaR NORMAPUR®