Orthophosphoric acid ≥85% VLSI for the electronics industry, J.T.Baker®
BAKR5372-05
: Avantor
:
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- Pk:14 lb
- Seq:7104
- Assay (H₃PO₄) (by acidimetry):85.0 - 87.0 %
- Color (APHA):≤10
- Specific Gravity at 60°/60°F:1.691 - 1.710
- Reducing Substances:Passes Test
- Volatile Acids (µeq/g):≤0.16
- Chloride (Cl):≤1.0 ppm
- Nitrate (NO₃):≤2 ppm
- Sulfate (SO₄):≤12 ppm
- Trace Impurities - Aluminum (Al):≤0.500 ppm
- Trace Impurities - Antimony (Sb):≤10.000 ppm
- Trace Impurities - Arsenic (As):≤0.050 ppm
- Trace Impurities - Calcium (Ca):≤1.500 ppm
- Trace Impurities - Chromium (Cr):≤0.200 ppm
- Trace Impurities - Cobalt (Co):≤0.050 ppm
- Trace Impurities - Copper (Cu):≤0.050 ppm
- Trace Impurities - Gold (Au):≤0.300 ppm
- Trace Impurities - ACS - Heavy Metals (as Pb):≤5 ppm
- Trace Impurities - Iron (Fe):≤2.0 ppm
- Trace Impurities - Lead (Pb):≤0.300 ppm
- Trace Impurities - Lithium (Li):≤0.100 ppm
- Trace Impurities - Magnesium (Mg):≤0.20 ppm
- Trace Impurities - Manganese (Mn):≤0.100 ppm
- Trace Impurities - Nickel (Ni):≤0.200 ppm
- Trace Impurities - Potassium (K):≤1.500 ppm
- Trace Impurities - Sodium (Na):≤2.500 ppm
- Trace Impurities - Strontium (Sr):≤0.100 ppm
- Trace Impurities - Titanium (Ti):≤0.300 ppm
- Trace Impurities - Zinc (Zn):≤2.000 ppm
- Particle Count - 0.5 µm and greater:≤150 par/ml
- Particle Count - 1.0 µm and greater:≤10 par/ml
:
:98 g/mol
:14,07344
:∼158 °C (1013 hPa)
:∼21 °C
:1.541 g/cm³ (20 °C)
:Ambient
:231-633-2
:1805
:8,III
:01-2119485924-24
:GHS05
:GHS07
:7664-38-2
:H₃PO₄
:MFCD00011340