Liquid photochemical filters designed for developer, DI water and solvent applications in POU photolithography processes.

• Advanced filtration media: optimises filtration and particle retention capabilities
• UPE membrane spontaneously wets and stays wet in solvents

Membrane: Patented surface-modified hydrophilic ultra-high molecular weight polyethylene (UPE); Supports, core and sleeve: HDPE; Housing: PP

Maximum operating temperature: 40 °C

Maximum inlet pressure: 3,9 bar at 25 °C

Maximum forward/reverse pressure: 2,8 bar at 25 °C