VWR® ARISTAR®, Tantalum Standard Solution, 10000 mg/L Ta in Water with Hydrofluoric Acid (max. 1%) (from Ta), Standard for ICP

Supplier: VWR Chemicals

Tantalum Standard, 10000 mg/L, VWR® ARISTAR®, Tantalum, Matrix: H₂O/tr HF, Application: ICP standards

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Zirconium standard solution, 10000 mg/L Zr in 5% hydrochloric acid with 2% hydrofluoric acid standard for ICP

Supplier: CPACHEM

Zirconium Standard, 10000 mg/L, Zirconium, Matrix: 2% HF, Application: ICP standards

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Silicon standard solution, 1000 mg/L Si in water with hydrofluoric acid (maximum 1%) (from ((NH₄)₂SiF₆) Certipur® standard for AAS, Supelco®

Supplier: Merck

Silicium Standard, 1000 mg/L, Certipur®, Supelco®, Silicon, Matrix: H₂O/tr HF, Application: AAS standards

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Tungsten standard solution, mg/L W in dil. nitric acid with 5% hydrofluoric acid standard for ICP

Supplier: CPACHEM

Tungsten Standard, 10000 mg/L, Tungsten, Matrix: Nitric acid dil., Application: ICP standards

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Tin standard solution, 10000 mg/L Sn in dil. nitric acid with 2% hydrofluoric acid standard for ICP

Supplier: CPACHEM

Tin Standard, 10000 mg/L, Tin, Matrix: Nitric acid dil., Application: ICP standards

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Niobium standard solution, 10000 mg/L Nb in 5% nitric acid and 5% hydrofluoric acid standard for ICP

Supplier: CPACHEM

Niobium Standard, 10000mg/L, Niobium, Matrix: 5% HNO₃/tr HF, Application: ICP standards

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Zirconium standard solution, 1000 mg/L Zr in dil. nitric acid with hydrofluoric acid (max. 1%) standard for ICP

Supplier: CPACHEM

Zirconium Standard, 1000 mg/L, Zirconium, Matrix: Nitric acid dil., Application: ICP standards

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Decontamination Solution, BodyNeutrAll

Supplier: Plum Safety

Mobile body shower with a highly effective decontamination solution for skin, surfaces and clothing. For fast and effective decontamination of bodies and surfaces in contact with corrosive and toxic hazardous substances such as strong acids and bases, oxidants, formaldehyde, phenols, organic solvents, hydrofluoric acid, and fluorides.

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Titanium standard solution, 10,000 mg/L Ti in 5% nitric acid with 2% hydrofluoric acid standard for ICP

Supplier: CPACHEM

Titanium Standard, 10000 mg/L, Titanium, Matrix: 5% HNO₃, Application: ICP standards

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Tungsten standard solution, mg/L W in nitric acid (max. 1%) with 2% hydrofluoric acid standard for ICP

Supplier: CPACHEM

Tungsten Standard, 1000 mg/L, Tungsten, Matrix: 2% HF, Application: ICP standards

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Zirconium standard solution, 10000 mg/L Zr in 5% nitric acid with 2% hydrofluoric acid standard for ICP

Supplier: CPACHEM

Zirconium Standard, 10000 mg/L, Zirconium, Matrix: 5% HNO₃, Application: ICP standards

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Tungsten standard solution, 1000 mg/L W in 5% nitric acid with hydrofluoric acid (max. 1%) (from W), standard for AAS, Specpure®

Supplier: Thermo Fisher Scientific

Tungsten Standard, 1000 mg/L, Specpure®, Tungsten, Matrix: 5% HNO₃, Application: AAS standards

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Molybdenum standard solution, 10000 mg/L Mo in 5% nitric acid and 4% hydrofluoric acid standard for ICP

Supplier: CPACHEM

Molybdenum Standard, 10000 mg/L, Molybdenum, Matrix: 5% HNO₃/4% HF, Application: ICP standards

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Tantalum standard solution, 10000 mg/L Ta in 5% nitric acid with 2% hydrofluoric acid standard for ICP

Supplier: CPACHEM

Tantalum Standard, 10000 mg/L, Tantalum, Matrix: 5% HNO₃, Application: ICP standards

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Molybdenum standard solution, 1000 mg/L Mo in nitric acid with hydrofluoric acid (each max. 1%) standard for ICP

Supplier: CPACHEM

Molybdenum Standard, 1000 mg/L, Molybdenum, Matrix: 1% HNO₃/1% HF, Application: ICP standards

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Drum pump sets for concentrated acids and alkalis, MA II

Supplier: LUTZ PUMPEN

This pump set is specially adapted for pumping concentrated acids and alkalis such as chloric acid, chromic acid, sulphuric acid, nitric acid, hydrofluoric acid and sodium hypochlorite. Pump tube and nozzle in PVDF and drum adapter made from PP.