Corrosive Sulphuric acid 50%, CMOS for microelectronic, J.T.Baker®
Catalog # 5253-09
Supplier: Avantor
CAS Number:
Specifications
- Pk:600 lb
- Seq:7350
Specifications
Specification Test Results
- For Microelectronic Use:49.0 - 51.0 %
- Assay (H₂SO₄):49.0 - 51.0 %
- Color (APHA):≤10
- Residue after Ignition:≤3 ppm
- Chloride (Cl):≤1 ppm
- Nitrate (NO₃):≤0.2 ppm
- Phosphate (PO₄):≤0.5 ppm
- Trace Impurities - Aluminum (Al):≤0.100 ppm
- Arsenic and Antimony (as As):≤0.005 ppm
- Trace Impurities - Barium (Ba):≤1.000 ppm
- Trace Impurities - Boron (B):≤0.010 ppm
- Trace Impurities - Cadmium (Cd):≤0.500 ppm
- Trace Impurities - Calcium (Ca):≤1 ppm
- Trace Impurities - Chromium (Cr):≤0.500 ppm
- Trace Impurities - Cobalt (Co):≤0.500 ppm
- Trace Impurities - Copper (Cu):≤0.010 ppm
- Trace Impurities - Gallium (Ga):≤0.050 ppm
- Trace Impurities - Germanium (Ge):≤0.500 ppm
- Trace Impurities - Gold (Au):≤0.500 ppm
- Trace Impurities - Iron (Fe):≤0.2 ppm
- Trace Impurities - Lead (Pb):≤0.400 ppm
- Trace Impurities - Lithium (Li):≤1.000 ppm
- Trace Impurities - Magnesium (Mg):≤1.000 ppm
- Trace Impurities - Manganese (Mn):≤0.500 ppm
- Trace Impurities - Nickel (Ni):≤0.1 ppm
- Trace Impurities - Potassium (K):≤1.000 ppm
- Trace Impurities - Silicon (Si):≤0.500 ppm
- Trace Impurities - Silver (Ag):≤0.500 ppm
- Trace Impurities - Sodium (Na):≤1.000 ppm
- Trace Impurities - Strontium (Sr):≤0.500 ppm
- Trace Impurities - Tin (Sn):≤0.500 ppm
- Trace Impurities - Zinc (Zn):≤0.500 ppm
Specification Test Results
About this item
:
:98.08 g/mol
Boiling Pt:∼100 °C (1013 hPa)
Density:1.1…1.4 g/cm³ (20 °C)
Storage Temperature:Ambient
EINECS:231-639-5
UN:2796
ADR:8,II
:GHS05
CAS Number:7664-93-9
Formula:H₂SO₄
MDL Number:MFCD00064589