Cartridge filters, Impact® 2 V2
Supplier: ENTEGRIS
Certificates
About this item
Superior retention performance for ultra-clean, point-of-use filtration of photoresist and photochemical solvents.
- Spontaneously wets in butyl acetate, PGMEA, PGME, ethyl lactate, MMP, cyclohexanone, ECA, NMP and other photochemical solvents
- Optimised for POU filtration of photoresist and photochemical solvents and aqueous chemicals
Membrane: UPE, nylon, PCM; Support: HDPE
Maximum operating temperature: 40 °C
Maximum forward/reverse differential pressure: 2,7 bar at 25 °C
Compatibility: PGMEA, PGME, NMP, ethyl lactate, MMP and cyclohexanone. Not recommended for use with photochemicals containing aromatic hydrocarbons.
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