Silicon Nitride TEM Window Grids, Electron Microscopy Sciences
Product Details & Documents
Silicon Nitride TEM Window Grids perform well under harsh lab conditions.
- Plasma cleanable - can be vigorously plasma cleaned to remove organic contamination
- Field to field uniformity - less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid
- Tolerates temperatures above 1000 °C - supports use in environmental TEMs where dynamic processes are observed at high temperatures
- Withstands harsh conditions - provides an ideal balance of imaging resolution, chemical stability and mechanical strength
- Incorporates LPCVD, low-stress(~250 MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces
The silicon frames are 100 µm thick. Grids fit standard 3 mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation.
Specifications
- Dimensions:(8) 100 µm, (1) 100×350 µm
- Thickness:20 nm
- Application:—
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Catalog #: CA21905-026
Supplier: Kimberly-Clark