Silicon Nitride TEM Window Grids perform well under harsh lab conditions.

• Plasma cleanable - can be vigorously plasma cleaned to remove organic contamination
• Field to field uniformity - less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid
• Tolerates temperatures above 1000 °C - supports use in environmental TEMs where dynamic processes are observed at high temperatures
• Withstands harsh conditions - provides an ideal balance of imaging resolution, chemical stability and mechanical strength
• Incorporates LPCVD, low-stress(~250 MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces

The silicon frames are 100 µm thick. Grids fit standard 3 mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation.