Silicon dioxide ≥99.995% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)
41096.KS
:
- VPE:1
- Seq:0001
- Environmentally Preferable:
: Silicon(IV) oxide, Silicium dioxide, Silicium (IV) oxide
:7631-86-9
:
:SiO₂
:MFCD00011232
:60.08 g/mol
:2230
:1719
:2.2 g/cm³ (20 °C)
:Kamertemperatuur
:231-545-4
:14808-60-7
:14,08493