Silicon(II) oxide ≥99.9% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 6.35 mm (0.250 in)
41093.KS
:
- Pk:1
- Seq:0001
:10097-28-6
:
:SiO
:MFCD00151536
:12,08640
:1880 °C
:>1702 °C
:2.13
:44.08 g/mol
:Ambient
:233-232-8